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    • 一木隆範、赤木貴則、「チップ型電気泳動による細胞の非侵襲計測」、バイオサイエンスとインダストリー 66(11)、pp.604-609 (2008).
    • T. Akagi, T. Ichiki, "Cell electrophoresis on a chip: what can we know from the changes in electrophoretic mobility?", Anal. Bioanal. Chem. 391(7), pp.2433-2441 (2008).
      doi: 10.1007/s00216-008-2203-9
    • S. Hirata, T. Ichiki, "Introduction of amino groups on poly(dimethylsiloxane) surface using low-pressure nitrogen-based inductively coupled plasma", J. Photopolym. Sci. Technol. 21(5), pp. 705-710 (2008).
      doi: 10.2494/photopolymer.21.705
    • 細居洋介、赤木貴則、一木隆範、「マイクロリアクターアレイチップを用いた酵素機能高効率スクリーニングシステムの開発」、電気学会論文誌 127-C(10)、pp. 1508-1514 (2007).
      doi: 10.1541/ieejeiss.127.1508
    • T. Akagi, M. Suzuki, S. Sato, T. Ichiki, "On-chip evaluation of damage on cell surfaces induced by cell dissociation agents", Jpn. J. Appl. Phys. 46(9B), pp. 6404-6409 (2007).
      doi: 10.1143/JJAP.46.6404
    • Y. Hamada, T. Ono, T. Akagi, K. Ishihara, T. Ichiki, "Photochemical oxidation of poly(dimethylsiloxane) surface and subsequent coating with biomimetic phosphorylcholine polymer", J. Photopolymer Sci. Tech. 20(2), pp. 245-249 (2007).
      doi: 10.2494/photopolymer.20.245
    • T. Ichiki, "Application of High-density Plasmas in Biodevice Technology", J. Jpn. Soc. Prec. Eng. 73(9), pp. 984-987 (2007).
      doi: 10.2493/jjspe.73.984
    • 平田孝道、畠山力三、金子俊郎、岡田健、秋谷昌宏、島谷裕一、一木隆範、赤木貴則、「ナノスコピックプラズマプロセスによるバイオデバイス構築」(解説)、プラズマ・核融合学会誌 83(8) pp. 647-657 (2007).
      プラズマ・核融合学会誌 HP
    • Helen M. L. Tan, H. Fukuda, T. Akagi, T. Ichiki, "Surface modification of poly(dimethylsiloxane) for controlling biological cells' adhesion using a scanning radical microjet", Thin Solid Films 515, Issue 12, pp. 5172-5178 (2007).
      doi: 10.1016/j.tsf.2006.10.026
    • T. Akagi, M. Suzuki, T. Ichiki, "Application of on-chip electrophoresis of cell to evaluation of cell cycle stages of HL-60 cells", Jpn. J. Appl. Phys. 45(37-41), pp. L1106-L1109 (2006).
      doi: 10.1143/JJAP.45.L1106
    • 赤木貴則、南野淳、一木隆範、「微細加工技術による細胞電気生理計測デバイスの開発」、電気学会論文誌 C 126(6), 730-735 (2006).
      doi: 10.1541/ieejeiss.126.730
    • 一木隆範、「マイクロプラズマ技術の先端バイオ計測への展開」機能材料 26(6), pp. 32-37 (2006).
    • Helen M. L. Tan, T. Akagi, T. Ichiki, "Localized plasma treatment of poly(dimethylsiloxane) surfaces and its application to controlled cell cultivation", J. Photopolymer Sci. and Technol. 19(2), pp. 245-250 (2006).
      doi: 10.2494/photopolymer.19.245
    • T. Ideno, T. Ichiki, "Maskless etching of microstructures using a scanning microplasma etcher", Thin Solid Films 506-507, pp. 235-238 (2006).
      doi: 10.1016/j.tsf.2005.08.271
    • Helen M. L. Tan, T. Ideno, T. Ichiki, "3 dimensional silicon micromachining using a scanning microplasma jet source", J. Photopolymer Sci. and Technol. 18, pp. 237-241 (2005).
      doi: 10.2494/photopolymer.18.237
    • 寺嶋和夫、伊藤剛仁、藤原秀行、片平研、河野明廣、王剣亮、荒巻光利、一木隆範、「ミクロ反応場の生成と応用 -マイクロプラズマ研究の現状と将来展望- 4.マイクロプラズマの応用」、プラズマ・核融合学会誌 80(10), pp. 845-853 (2004).
      doi: 10.1585/jspf.80.845
    • F. Omasu, Y. Nakano, T. Ichiki, "Measurement of the electrophoretic mobility of sheep erythrocytes using microcapillary chips", Electrophoresis 26, Issue 6, pp. 1163-1167 (2005).
      doi: 10.1002/elps.200410182
    • T. Ideno, T. Ichiki, "Hydrophilic patterning of polymer surfaces using a scanning microplasma jet source", J. Photopolymer Science. and Technol. 17, Issue 2, pp. 173-176 (2004).
      doi: 10.2494/photopolymer.17.173
    • K. Takahashi, A. Hattori, I. Suzuki, T. Ichiki, K. Yasuda, "Non-destructive on-chip cell sorting system with real-time microscopic image processing", J. Nanobiotechnology, 2(5), pp. 5-12 (2004).
      doi: 10.1186/1477-3155-2-5
    • 堀池靖浩、一木隆範、沖明男「プラズマプロセスによるバイオチップの開発と展望」、応用物理、73(4), pp. 470-475 (2004).
    • T. Ichiki, R. Taura, Y. Horiike, "Localized and ultrahigh-rate etching of silicon wafers using atmospheric-pressure microplasma jets", J. Appl. Phys. 95(1), pp. 35-39 (2004).
      doi: 10.1063/1.1630375
    • T. Ichiki, Y.Sugiyama, T. Ujiie, Y. Horiike, "Deep dry etching of borosilicate glass using fluorine-based high-density plasmas for microelectromechanical system fabrication", J. Vac. Sci. Technol. B 21, Issue 5, pp. 2188-2192 (2003).
      doi: 10.1116/1.1612935
    • T. Ichiki, T. Koidesawa, Y. Horiike, "An atmospheric-pressure microplasma jet source for the optical emission spectroscopic analysis of liquid sample", Plasma Sources Sci. Technol. 12(4), S16-S20 (2003).
      doi: 10.1088/0963-0252/12/4/315
    • T. Ichiki, Y. Sugiyama, R. Taura, T. Koidesawa, Y. Horiike, "Plasma applications for biochip technology", Thin Solid Films 435(Issue 1-2), pp. 62-68 (2003).
      doi: 10.1016/S0040-6090(03)00370-5
    • Y. Otsu, Y. Toku, D. Kobayashi, T. Ichiki, "Plasma process applied in the fabrication of plastic microfluidic chips", J. Photopolymer Sci. and Technol. 16(1), pp.39-42 (2003).
      doi: 10.2494/photopolymer.16.39
    • A. Oki, M. Takai, H. Ogawa, Y. Takamura, T. Fukasawa, J. Kikuchi, Y. Ito, T. Ichiki, Y. Horiike, "Healthcare chip for checking health condition from analysis of trace blood collected by painless needle", Jpn. J. Appl. Phys. 42, Part 1, Number 6A, pp. 3722-3727 (2003).
      doi: 10.1143/JJAP.42.3722
    • Y. Morikawa, T. Shibayama, S. Takayanagi, H. Ita, H. Shindo, T. Ichiki, Y. Horiike, "Etching Reactivity of Negative Ions Generated in Cl2 Downstream Plasma", Jpn. J. Appl. Phys. 42, Part 1, Number 3, pp. 1435-1440 (2003).
      doi: 10.1143/JJAP.42.1435
    • H. Ogawa, T. Arai, M. Yanagisawa, T. Ichiki, Y. Horiike, "Dry cleaning technology for removal of silicon native oxide employing hot NH3/NF3 exposure", Jpn. J. Appl. Phys. 41, Part 1, Number 8, pp. 5349-5358 (2002).
      doi: 10.1143/JJAP.41.5349
    • T. Ichiki, T. Ujiie, S. Shinbashi, T. Okuda, Y. Horiike, "Immunoelectrophoresis of red blood cells performed on microcapillary chips", Electrophoresis 23, Issue13, pp. 2029-2034 (2002).
      doi: 10.1002/1522-2683(200207)23:133.0.CO;2-R
    • T. Ichiki, S. Shinbashi, T. Ujiie, Y.Horiike, "Microchip technologies for the analysis of biological cells", J. Photopolymer, Sci. Technol. 15(3) pp. 487-492 (2002).
      doi: 10.2494/photopolymer.15.487
    • T. Ichiki, Y. Sugiyama, Y. Horiike, "Miniaturized Capillary electrophoresis fabricated on Pyrex glass chips using deep dry etching and anodic bonding", J. Photopolymer, Sci. Technol. 15(2) pp. 311-316 (2002).
      doi: 10.2494/photopolymer.15.311
    • 一木隆範、「ナノヘルスケアチップ」、バイオインダストリ-、19(3), pp. 39-45, (2002).
    • A. Oki, Y. Takamura, T. Fukasawa, H. Ogawa, Y. Ito, T. Ichiki, Y. Horiike, "Study on elemental technologies for creation of healthcare chip fabricated on polyethylene Terephthalate Plate", IEICE Trans. Electron., E84-C(12), pp. 1801-1806 (2001).
      IEICE HP
    • 一木隆範、田浦了、堀池靖浩、「大気圧マイクロプラズマジェットの微細加工への応用」、表面技術 52(12), pp. 843-844 (2001).
      doi: 10.4139/sfj.52.843
    • 一木隆範、「VHF駆動によるマイクロプラズマの生成技術とマイクロ化学分析システムへの応用」、応用物理、70(4), pp. 452-453 (2001).
      doi: 10.11470/oubutsu1932.70.452
    • A. Oki, S. Adachi, Y. Takamura, K. Ishihara, H. Ogawa, Y. Ito, T. Ichiki, Y. Horiike, "Electroosmosis injection of blood serum into biocompatible microcapillary chip fabricated on quartz plate", Electrophoresis 22, Issue2, pp. 341-347 (2001).
      doi: 10.1002/1522-2683(200101)22:23.0.CO;2-W
    • 堀池靖浩、沖明男、高村禅、一木隆範、「日々の健康管理-ヘルスケアデバイスの創製-」、高分子 49(9)、pp. 652-655 (2000).
      doi: 10.1295/kobunshi.49.652
    • T. Ujiie, T. Kikuchi, T. Ichiki, Y. Horiike, "Fabrication of quartz microcapillary electrophoresis chips using plasma etching", Jpn. J. Appl. Phys., 39, Part 1, Number 6A, pp. 3677-3682 (2000).
      doi: 10.1143/JJAP.39.3677
    • P.-W. Lee, S.-S. Kim, S.-H. Seo, C.-S. Chang, H.-Y. Chang, T. Ichiki, Y. Horiike, "A new inside-type segmented coil antenna for uniformity control in a large-area inductively coupled plasma", Jpn. J. Appl. Phys., 39, Part 2, Number 6A, L548-L550 (2000).
      doi: 10.1143/JJAP.39.L548
    • T. Ichiki, S. Takayanagi, Y. Horiike, "Precise chrome etching in downstream chlorine plasmas with electron depletion through negative ion production", J. Electrochem. Soc. 147(11), pp. 4289-4293 (2000).
      doi: 10.1149/1.1394055
    • H. Oshio, T. Ichiki, Y. Horiike, "Run-to-run evolution of fluorocarbon radicals in C4F8 plasmas interacting with cold and hot inner walls", J. Electrochem. Soc. 147(11), pp. 4273-4278 (2000).
      doi: 10.1149/1.1394052
    • Y.Chinzei, M.Ozawa, T. Kikuchi, K.Horioka, H.Shindo, T.Ichiki, Y.Horiike, "High aspect ratio SiO2 etching with high resist selectivity improved by addition of organosilane to tetrafluoroethyl trifluoromethyl ether", J. Vac. Sci. Technol. A, 18, Issue 1, pp. 158-165 (2000).
      doi: 10.1116/1.582132
    • Y. Horiike, M. Ogata, H. Oshio, Y. Chinzei, Y. Feurprier, Y. Takamura and T. Ichiki, "Fine/High aspect ratio SiO2 and gap etching", Soc. Proc., 99-18, pp. 329-344(1999).
    • T. Ichiki, H. Oshio, Y. Horiike, "Charge referencing of XPS spectra from fluorocarbon polymer films using fluorine as an internal standard", J. Surf. Anal. , 5(2), pp. 193-196(1999).
      JSA HP
    • Y. Feurprier, Y. Chinzei, M. Ogata, T. Kikuchi, M. Ozawa, T. Ichiki, Y. Horiike, "Microloading effect in ultrafine SiO2 hole/trench etching", J. Vac. Sci. Technol. A, 17, Issue 4, pp. 1556-1561 (1999).
      doi: 10.1116/1.581852
    • 鎮西康彦、小澤正則、菊地俊秋、堀岡啓治、進藤春雄、一木隆範、堀池靖浩、"テトラフルオロエチルトリフルオロメチルエーテル (HFE 227) への有機シラン添加による高選択比・高アスペクト比酸化膜エッチング"、真空 41(8)、pp. 685-691(1998).
      doi: 10.3131/jvsj.41.685
    • Y. Chinzei, M. Ogata, T. Sunada, M. Itoh, T. Hayashi, H. Shindo, R. Itatani, T. Ichiki, Y. Horiike, "Development and plasma characteristics measurement of planar-type magnetic neutral loop discharge etcher", Jpn. J. Appl. Phys., 37, Part 1, Number 8, pp. 4572-4577 (1998).
      doi: 10.1143/JJAP.37.4572
    • Y. Chinzei, T. Ichiki, N. Ikegami, H. Shindo, Y. Horiike, "Residence Time Effects on SiO2/Si Selective Etching employing high density fluorocarbon plasma", J. Vac. Sci. Technol. B, 16, Issue 3, pp. 1043-1050 (1998).
      doi: 10.1116/1.590007
    • Y. Chinzei, M. Ogata, J. Takekawa, N. Hirashita, T. Hayashi, H. Shindo, T. Ichiki, Y. Horiike, "Flow rate rule for high aspect ratio SiO2 hole etching", J. Vac. Sci. Technol. A, 16, Issue 3, pp. 1519-1524 (1998).
      doi: 10.1116/1.581180
    • Y. Morikawa, K. Kubota, H. Ogawa, T. Ichiki, A. Tachibana, S. Fujimura, Y. Horiike, "Reaction of the fluorine atom and molecule with the hydrogen-terminated Si(111) Surface", J. Vac. Sci. Technol. A, 16, Issue 1, pp. 345-355 (1998).
      doi: 10.1116/1.581004
    • T. Ichiki, T. Kikuchi, S. Shingubara, Y. Horiike,"Gap-filling of Cu employing sustained self-sputtering with inductively coupled plasma ionization
      ", Jpn. J. Appl. Phys., 36, Part 1, Number 3B, pp. 1469-1472 (1997).
      doi: 10.1143/JJAP.36.1469
    • 堀池靖浩、柴山利一、高柳智士、一木隆範、進藤春雄、「フッ素,塩素負イオン生成とSi,SiO2とのエッチング反応」、プラズマ・核融合学会誌、72(11)、pp. 1168-1174 (1996).
      JSPF HP
    • T. Ichiki, S. Amagi, T. Yoshida: "Initial stage of cubic boron nitride film growth from vapor phase", J. Appl. Phys. 79, Issue 8, pp. 4381-4387 (1996).
      doi: 10.1063/1.361747
    • Y. Chinzei, T. Ichiki, R. Kurosaki, J. Kikuchi, N. Ikegami, T. Fukazawa, H. Shindo, Y. Horiike: "SiO2 Etching employing inductively coupled plasma with hot inner wall", Jpn. J. Appl. Phys., 35, Part 1, Number 4B, pp. 2472-2476 (1996).
      doi: 10.1143/JJAP.35.2472
    • 津田統、一木隆範、吉田豊信、「気相プロセスによる立方晶窒化ほう素薄膜の堆積」、 まてりあ 33(9)、 pp.1168-1177 (1994).
      doi: 10.2320/materia.33.1168
    • T.Ichiki, T.Yoshida, “Growth of cubic boron nitride films by low-pressure inductively coupled plasma enhanced chemical vapor deposition”, Jpn. J. Appl. Phys. 33, Part 1, Number 7B, pp.4385-4388 (1994).
      doi: 10.1143/JJAP.33.4385
    • 一木隆範、吉田豊信、「プラズマCVD法によるc-BN合成」、NEW DIAMOND 10(2) pp.32-33 (1994).
    • T. Ichiki, T. Yoshida: "Preparation of cubic boron nitride films by low pressure inductively coupled plasma enhanced chemical vapor deposition", Appl. Phys. Lett., 64, Issue 7, pp.851-853 (1994).
      doi: 10.1063/1.111001
    • T. Ichiki, T. Momose, T. Yoshida: "Effects of the substrate bias on the formation of cubic boron nitride by inductively coupled plasma enhanced chemical vapor deposition", J. Appl. Phys. 75, Issue 3, pp.1330-1334 (1994).
      doi: 10.1063/1.356411